99.99% High Purity Tantalum sputtering target used in semiconductor

99.99% High Purity Tantalum sputtering target used in semiconductor

 

99.99% High Purity Tantalum sputtering target

 

Tantalum sputtering target of Description

 

Material

Tantalum

Grade

R05200, R05400, R05240(Ta-40Nb), R05252(Ta-2.5W), R05255(Ta-10W)

Standard

ASTM B708. GB/T 3629

Purity

99.95%min

Size

Custom-made as per drawing

Shape

Circular / planar / tubular

Application

Decoration Industry/Glass industry/flat panel display/solar/resistance/electroplating fieldand other coating

Condition

1.Hot-rolled/Cold-rolled
2.Alkaline Cleaning
3.Electrolytic Polish
4.Machining, grinding
5.Stress relief annealing

Mechanical property
(Annealed)

  Grade                      Tensile strength min      Yield strength min      Elongation min, % 
  (UNS)  
                          psi (MPa)                       psi(MPa)(2%)         (1 inch gage length)

(RO5200, RO5400)        30000 (207)                    20000 (138)                       20
Ta-10W (RO5255)         70000 (482)                    60000 (414)                       15
Ta-2.5W (RO5252)         40000 (276)                   30000 (207)                       20
Ta-40Nb (RO5240)         35000 (241)                    20000 (138)                      25

Tantalum sputtering target of show

 

 

 

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