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99.995% Pure Titanium Plate Titanium Sputtering Target
99.995% Pure Titanium Plate Titanium Sputtering Target
Titanium Sputtering Target of Product Description
Titanium is recognized for its high strength-to-weight ratio. It is a strong metal with low density that is quite ductile (especially in an oxygen-free environment), lustrous, and metallic-white in color. The relatively high melting point (more than 1,650 °C or 3,000 °F) makes it useful as a refractory metal. It is paramagnetic and has fairly low electrical and thermal conductivity.
·Titanium Sputtering Target of specification
| product name |
99.995% Pure Titanium Plate Titanium Sputtering Target |
|
Purity |
99.995% |
|
Color |
Grayish White, Lustrous, Metallic |
|
Sputter |
DC |
|
Size |
Tube/ Plate, Customized |
|
Processing Method |
Smelting and casting |
|
Service |
Target Bonding with Indium |
Other Metal Targets
|
Formula |
Name |
Purity |
Formula |
Name |
Purity |
|
Al |
Aluminum Target |
5N-5N5 |
Nb |
Niobium Target |
3N5-4N |
|
B |
Boron Target |
3N |
Ni |
Nickel Target |
3N5-5N |
|
Bi |
Bismuth Target |
4N-5N |
NiCr |
Nickel Chromium |
3N 3N5 |
|
Ca |
Calcium Target |
2N5 |
Pb |
Plumbum Target |
5N |
|
Cd |
Cadmium Target |
4N |
Sb |
Antimony Target |
4N |
|
Co |
Cobalt Target |
3N5 |
Se |
Selenium Target |
4N |
|
Cr |
Chromium Target |
2N5-3N5 |
Si |
Silicon Target |
5N |
|
CrAl |
Chromium Aluminum |
3N |
Sn |
Tin Target |
4N |
|
Cu |
Copper Target |
4N-6N |
Ta |
Tantalum Target |
3N5-4N |
|
Fe |
Iron Target |
3N5 |
Te |
Tellurium Target |
4N |
|
Ge |
Germanium Target |
5N |
Ti |
Titanium Target |
2N5-5N |
|
Hf |
Hafnium Target |
3N5 |
TiAl |
Titanium Aluminum |
3N |
|
In |
Indium Target |
4N5 |
V |
Vanadium Target |
3N |
|
Li |
Lithium Target |
3N |
W |
Tungsten Target |
3N5-5N |
|
Mg |
Magnesium Target |
3N5-4N |
WTi |
Tungsten Titanium |
3N-4N |
|
Mn |
Manganese Target |
3N |
Zn |
Zinc Target |
4N5 |
|
Mo |
Molybdenum Target |
3N5-4N |
Zr |
Zirconium Target |
2N5-3N5 |
Titanium Sputtering Target of introduction
our company specializes in producing high density, ultra high purity (99.9% to 99.9999%) metal sputtering targets for all applications using both vacuum melt/casting and hot isostatic pressing (HIP) technology. Sputtering targets are available monoblock or bonded with dimensions up to 1500 mm. Research-sized targets are also available, as are custom sizes and alloy compositions.
All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS) and Inductively Coupled Plasma (ICP).