High purity 99.99% niobium penoxide Nb2O5 target
High purity 99.99% niobium penoxide Nb2O5 target
Nb2O5 target of Product Description
Niobium belongs to the group of refractory metals. Refractory metals are metals that have a higher melting point than platinum (1 772 °C). In refractory metals, the energy binding the individual atoms together is particularly high. Refractory metals have a high melting point coupled with a low vapor pressure, high modulus of elasticity and high thermal stability. Refractory metals are also characterized by a low coefficient of thermal expansion. Compared to other refractory metals, niobium has a relatively low density of only 8.6 g/cm3.
Nb2O5 target of Product Discription
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Item Name |
Niobium (Nb) sputtering target |
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Available Purity |
3N,3N5 |
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Dimension |
As per your request |
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Available Shape |
Planar, round |
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Density |
8.58g/m³ |
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Melting point |
2468℃ |
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Boiling point |
4928℃ |
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Technology |
Vacuum Melting, Patented thermo-mechanical process and machine work |
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Application |
Semiconductors, Micro-Electronics etc. |
Niobium Sputtering Target Nb2O5 target of Display
We are professional factory to produce all kinds of materials Disc/Planar/Rotary sputtering target. Ti sputtering target, Zr sputtering target, Cr sputtering target, Ni sputtering target, Cu sputtering target, Mo sputtering target, W sputtering target, Nb sputtering target, Ta sputtering target, V sputtering target, Al-Ti sputtering target, Ni-Cr sputtering target, Nb-Zr sputtering target, Mo-Nb sputtering target, Al alloy sputtering target, Al-Ti- Si sputtering target, Cr-al sputtering target, Si-Ai sputtering target, Ni-V sputtering target and Ti-Zr sputtering target are all mainly products.
Chemical Component of Nb Sputtering Target Nb2O5 target
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Chemistry % |
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Designation |
Chief component |
Impurities maximum |
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Nb |
Fe |
Si |
Ni |
W |
Mo |
Ti |
Ta |
O |
C |
H |
N |
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Nb1 |
Remainder |
0.004 |
0.003 |
0.002 |
0.004 |
0.004 |
0.002 |
0.07 |
0.015 |
0.004 |
0.0015 |
0.002 |
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Nb2 |
Remainder |
0.02 |
0.02 |
0.005 |
0.02 |
0.02 |
0.005 |
0.15 |
0.03 |
0.01 |
0.0015 |
0.01 |
Tensile of Niobium Sputtering Target Nb2O5 target
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Grade |
Tensile strength δbpsi (MPa), ≥ |
Yield strength δ0.2, psi (MPa),≥ |
Elongation in 1"/2" gage length, %, ≥ |
|
RO4200-1 |
18000 (125) |
12000 (85) |
25 |
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RO4210-2 |
Planar Target
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Plate Target |
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Material |
Type |
Size |
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Ti Target |
Planar |
Width: 20mm to 600mm |
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Ni Target |
Length: 20mm to 2000mm |
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Zr Target |
Thickness: 1mm to 10mm |
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Mo Target |
customer's requirements |
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Ti-Al Target |
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SS Target |
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Marks: Manufacturing processes depend on the properties of the target material and application.
Fabrication methods vary from vacuum melting and rolling, hot-pressed, special press-sintered process, vacuum hot-pressed and forged.