WTi Alloy Tungsten Titanium sputtering target for vacuum coating

WTi Alloy Tungsten Titanium sputtering target for vacuum coating


WTi Alloy Tungsten Titanium sputtering target for vacuum coating、

 

WTi Alloy Tungsten Titanium sputtering target of Product Description

1. Grade: W1

2. Purity :> =99.95%

3. Characteristic: high purity, high temperature, high resistance corrision

4.Melting Point: 3410°C

5.Boiling Point:5927°C

6.Density: 19.3g/cm3

7.High quality, workability

8. Certificate: ISO9002

9. Product Feature: High melting point, High-density, high temperature oxidation resistance, long service life, resistance to corrosion..

10. More details about tungsten target

WTi Alloy Tungsten Titanium sputtering target of show

 

  As-rolled Surface Finish

  Ground Surface Finish

Minimum Thickness

0.125"+/-0.020"

Minimum Thickness

 

Maximum Width

12"

Maximum Width

12"

Maximum Length

24"

Maximum Length

24"

Maximum Thicknes

0.400"+/-0.030"

Maximum Thicknes

0.400"+/-0.005"

Maximum Width

12"

Maximum Width

12"

Maximum Length

12"

Maximum Length

12"

WTi Alloy Tungsten Titanium sputtering target of Application:

Sputtering targets are wildly used in decorative coating industry, semiconductor, electronic, displayer, solar energy, Integrated circuit, optical element, Function coating, Surface decoration, Glass coating, micro-electronics, Miniature components, Optical communication, Medical devices and so on..

 

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