Good quality WNiCu And WNiFe tungsten alloy weight
tungsten alloy weight is a weight that is used to increase the weight of the body to keep the balance. The weight tungsten has a high density and can complete the weight ratio in a small space. The weight tungsten is widely used, which can be used in golf head weight, tennis weight, sailing weight, submarines weight and weapon counterweight. The weight tungsten generally uses the sintering process to produce different shapes of products.
Features:
W80Cu20 tungsten copper alloy rod
1. High hardness, high density, High strength, high heat resistant;
2. Excellent thermal and electrical conductivity;
3. Better arc burning loss resistance, erosion resistance;
4. Easy to be machined.
Application: 1. Our tungsten copper is widely used in many industrial areas such as aerospace, power, electronic, metallurgy, and machinery; 2. It is also used for cooling device in electronic equipment;
Titanium is recognized for its high strength-to-weight ratio. It is a strong metal with low density that is quite ductile (especially in an oxygen-free environment), lustrous, and metallic-white in color. The relatively high melting point (more than 1,650 °C or 3,000 °F) makes it useful as a refractory metal. It is paramagnetic and has fairly low electrical and thermal conductivity.
Item Name
Ti target 99.999% Pure Ti Sputtering Titanium TargetTi target 99.999%
Purity
99.99%~99.995%
Shape
Round target/according to your request
Available size
1.Ø30–2000mm,
Product Applications Medical Field(Dental implants) Titanium have even the same elasticity modulus as human bone,also withhold good Biocompatibility with human body and Corrosion Resistance Features decide it is wildly used in medical field. Products including medical Titanium Nails,Titanium tooth,Titanium bone fracture plate,Titanium artificial limb,etc.
General introduction
Certification
ISO 9001:2015
Standard
ASTM B381,ASTM 4928,ASTM B348 grade5
Specification
Diameter: 150-1300mm,
Manufacturer of sputtering target materials tantalum sputteringtarget
Product Description
Item Name:Tantalum Target 99.99% Planar Target
Purity: 99.9%
Available size Round: dia 20~250mm
Rectangular: length up to 1600mm
Customization is available
Oxygen content: low
Certificates: ISO9001:2008, the third test report
Technics: Powder Metallurgy
Application :widely used in coating processing industries
a: architectural glass,
Product Description
99.95% Pure Mo Molybdenum Plate Mo Sputtering Target
Molybdenum is a silvery-grey metal with a Mohs hardness of 5.5. It has a melting point of 2,623 °C (4,753 °F); of the naturally occurring elements, only tantalum, osmium, rhenium, tungsten, and carbon have higher melting points. Weak oxidation of molybdenum starts at 300 °C (572 °F). It has one of the lowest coefficients of thermal expansion among commercially used metals.
High Quality Gr1 Pure Titanium Sputtering/ forging round Target
99.995% Pure Titanium Plate Titanium Sputtering Target Titanium is recognized for its high strength-to-weight ratio. It is a strong metal with low density that is quite ductile (especially in an oxygen-free environment), lustrous, and metallic-white in color. The relatively high melting point (more than 1,650 C or 3,000 F) makes it useful as a refractory metal. It is paramagnetic and has fairly low electrical and thermal conductivity.
hot sale china factory zr 702 zirconium target with best price
Zirconium is a lustrous, greyish-white, soft, ductile and malleable metal that is solid at room temperature, though it is hard and brittle at lesser purities. The melting point of zirconium is 1855 °C (3371 °F), and the boiling point is 4371 °C (7900 °F). Zirconium has an electronegativity of 1.33 on the Pauling scale. Of the elements within the d-block with known electronegativities,
High purity W Sputtering Target Tungsten target 99.95%
Specification of W Sputtering Target
JX metal specializes in producing high purity Tungsten Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading,
high quality alkali washing surface white molybdenum wire for high temp furnace
application
1.Molybdenum wire is mainly used for auto parts spraying
2.Molybdenum wire for wire-cutting application is characteristic in high tensile strength, good electric discharge, smooth finish, high cutting speed, long life and etc.
3.It is also used as electric light source parts, high temperature and heating elements, etc.
Name
Good Toughness Molybdenum Wire for Sale