excellent quality cl10/cl11/cl12 tungsten copper alloy and copper tungsten tube made for rod/plate/sheet/block shape

  

tungsten copper alloy of Product Description

  

Tungsten rod has special properties, such as low thermal expansion, good heat conductivity, enough electrical resistance and high modulus of elasticity. So tungsten rod is widely used in all fields such as support line, lead-in wire,

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hot sale Future titanium ASTM F1713 Surgical Implant Titanium Rods Ti-13Nb-13Zr

 

hot sale Future titanium ASTM F1713 Surgical Implant Titanium Rods Ti-13Nb-13Zr

 

Titanium Rods Ti-13Nb-13Zr of description

 

commercial

  titanium rod ti13Nb 13Zr

Chemical composition

  TI-13Nb -13Zr
 

Application
 

Surgical implant

Advantage

biocompatibal, light, hard, safe to implant. etc.

Size

Diameter: 6mm to 65mm

Length: <6000mm

 

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WTi Alloy Tungsten Titanium sputtering target for vacuum coating


WTi Alloy Tungsten Titanium sputtering target for vacuum coating、

 

WTi Alloy Tungsten Titanium sputtering target of Product Description

1. Grade: W1

2. Purity :> =99.95%

3. Characteristic: high purity, high temperature, high resistance corrision

4.Melting Point: 3410°C

5.Boiling Point:5927°C

6.Density: 19.3g/cm3

7.High quality, workability

8. Certificate: ISO9002

9. Product Feature: High melting point,

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Titanium or molybdenum(MO)sputtering target for photoelectron and semiconductor/molybdenum target

 

Titanium or Molybdenum(MO)sputtering target for photoelectron and semiconductor/molybdenum target

 

  

Molybdenum(MO)sputtering target of Product Introduction

We manufacture high quality sputtering targets in pure metals, alloys, and ceramic materials.

We usually adopt Vacuum Melting or Hot Isostatic Pressing (HIP) to produce metal&alloy targets and Hot Pressed Sintering for ceramic targets. We choose the appropriate production process to manufacture the products to meet your specific application requirements.

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TiO2 Planar target

 

99.9% dia 150mm titanium disk cr Tio2 sputtering silver target made in china  

 

Tio2 sputtering silver target of Product Introduction

 

We manufacture high quality sputtering targets in pure metals, alloys, and ceramic materials.We usually adopt Vacuum Melting or Hot Isostatic Pressing (HIP) to produce metal&alloy targets and Hot Pressed Sintering for ceramic targets.

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Factory Price High quality thin tungsten plates /sheets

Factory Price High quality thin tungsten plates /sheets

 

tungsten plates /sheets of description

 

1, Grade: W1, W2, W3

2, Width*Length: (2.0-500.0mm)*(2.0-500.0mm)

3, Thickness: 0.2mm-15.0mm

4, Density: Purity 99.92%, 99.98% can also be achieved if special demanded.

5, Surface: Cold rolled surface ,hot rolled surface ,Sintering surface, Forged surface

Parameters of tungsten plates /sheets:

 

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High purity metal Niobium rotary Sputtering Target for Semiconductors industry

High purity metal Niobium rotary Sputtering Target for Semiconductors industry

 

Product Discription of Product Discription

 

Niobium belongs to the group of refractory metals. Refractory metals are metals that have a higher melting point than platinum (1 772 °C). In refractory metals, the energy binding the individual atoms together is particularly high. Refractory metals have a high melting point coupled with a low vapor pressure,

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