Product Description
Item Name:Tantalum Target 99.99% Planar Target
Purity: 99.9%
Available size Round: dia 20~250mm
Rectangular: length up to 1600mm
Customization is available
Oxygen content: low
Certificates: ISO9001:2008, the third test report
Technics: Powder Metallurgy
Application :widely used in coating processing industries
a: architectural glass, car using glass, graphic display field.
b:electronic and semiconductor field.
c:decoration and mould field.
d:optics coating materials
Advantage:
High Hard texture
Low impurity content
Better heat dissipation
High Tensile strength
Item Name |
Tantalum (Ta) sputtering target |
Available Purity |
3N,3N5,4N |
Dimension |
As per your request |
Available Shape |
Planar, Rotary |
Density |
16.654g/m³ |
Melting point |
2996℃ |
Boiling point |
5425℃ |
Technology |
Vacuum Melting, Patented thermo-mechanical process and machine work |
Application |
Semiconductors, Micro-Electronics etc. |