High purity Zirconium sputtering target, Zr sputtering targets
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High purity Zirconium sputtering target, Zr sputtering targets
We are professional factory to produce all kinds of materials Disc/Planar/Rotary sputtering target. Ti sputtering target, Zr sputtering target, Cr sputtering target, Ni sputtering target, Cu sputtering target, Mo sputtering target, W sputtering target, Nb sputtering target, Ta sputtering target, V sputtering target, Al-Ti sputtering target, Ni-Cr sputtering target, Nb-Zr sputtering target, Mo-Nb sputtering target, Al alloy sputtering target, Al-Ti- Si sputtering target, Cr-al sputtering target, Si-Ai sputtering target, Ni-V sputtering target and Ti-Zr sputtering target are all mainly products.
If there are no sputtering target you need, pls click here, We will according to your requirement to produce it.
Zr sputtering Target of Products attributes
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Item Name |
High purity Zirconium sputtering target, Zr sputtering targets |
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Purity |
99.95% |
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Shape |
Flat/rotary target, according to your request |
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Available size |
Round: dia 25~550mm, Thickness:3~30mm Rectangular: Length up to 2000mm Customization is available |
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Certificates |
ISO9001:2008, SGS, The third test report |
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Technics |
Hot isostatic pressing |
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Application |
Widely used in coating processing industries Decoration and mould field. etc. |
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Detailed information |
Zirconium is rare metal with amazing corrosion resistance, high melting point, high hardness and high strength characteristics, widely used in aerospace, military project, nuclear reactions and atomic energy field. |
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High purity Zirconium sputtering target, Zr sputtering targets |
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Quality Standard (99.95% Zr) |
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Element |
Value (<ppm) |
Element |
Value (<ppm) |
Element |
Value (<ppm) |
|
Li |
0.1 |
Fe |
5 |
Mn |
0.1 |
|
Na |
1 |
Hf |
100 |
Cu |
0.5 |
|
Si |
1 |
H |
1 |
Cd |
0.5 |
|
Ca |
0.5 |
N |
2 |
Pb |
0.1 |
|
Cr |
0.5 |
B |
0.1 |
Ti |
2.5 |
|
Ni |
0.5 |
Al |
1 |
Mo |
1 |
|
Nb |
0.5 |
K |
1 |
C |
5.6 |
|
Be |
0.1 |
V |
0.1 |
O |
14 |
|
Sn |
0.1 |
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Zirconium sputtering target Of Product Description:
metal sputtering targets have been accepted in a wide range of applications from ferromagnetic thin films, high index films in infrared filters, semiconducting films, capacitor dielectric films, photo conductive films, lubricant films, magnetic and memory elements to name but a few.
Zirconium sputtering target of Technology:
Manufacturing processes we use depend on the properties of the target material and its application. Fabrication methods vary from vacuum melting and rolling, hot-pressed, special press-sintered process, vacuum hot-pressed and forged.