Product Description
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High Purity Titanium Sputter Target
High Purity Titanium Sputter Targets mainly processes titanium sponge by electron beam cooling and smelting, and then undergoes various mechanical processes such as rolling, forging, grinding and cutting to make targets of various sizes and specifications. High Purity Titanium Sputter Targets are suitable for various magnetron sputtering machines and ion coating machines, and are often widely used in thin film deposition technology, glass coating industry and hardware coating industry, such as PVD and CVD coating, colored glass, car rearview mirror , flat panel displays, casting molds and cutting knives, etc.
High Purity Titanium Sputter Target For the High Purity Titanium Sputter Target material, the higher the chemical purity of the metal, the better the conductivity of the film made from it. Titanium is a paramagnetic refractory metal, especially in an oxygen-free environment with strong corrosion resistance and high toughness. The high-quality thin film decorative coating deposited by Titanium Sputtering Target can improve the friction and wear resistance of the workpiece surface, further improving the processing efficiency and quality.
Titanium Sputter Target Specifications:
|
Grade |
Gr1-12 |
|
Technique |
Sintering,Forging,Annealing,Rolling,Vacuum Melting,Machining |
|
Purity |
99.2%-99.995% |
|
Diameter |
10-1000mm |
|
Thickness |
1-100mm |
|
Density |
4.5g/cm3 |
|
Surface |
Polished,Bright,Chemical Cleaning,Black Oxide,etc. |
|
Shape |
Disc,Plate,Rectangular,Square,Column Targets, |
|
Standard |
ASTM B348,GB,AMS |
|
Certification |
ISO9001,ISO14001 |
High Purity Titanium Sputter Target Picture:
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