Products
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1.Standard:ASTM F1713 etc
2.High Precision:H9,H8,H7
3.Grades:Ti-13Nb-13Zr
4.High light:exclude of AL or V
5.Of better mechanical property
6.New Beta titanium alloy materials -
Ti-15V-3Cr-3Sn-3Al Plate ASTM B265 ST=solution Treated. Beta alloy which is suitable for strip-rolling and heat-treating. Highly formable, good room temperature bending properties, solution treatment results in high strengths.
Applications: Aerospace, flat-rolled products, fasteners, foil, plate, tubing, castings and forgings. -
1.0mm diameter price per kg Ti3Al2.5V titanium alloy wire
price of 1.0mm diameter Ti3Al2.5V titanium wire per kg
ti3al2.5v wire dia 1mm,
Titanium and 3%aluminum and 2.5%vanadium. -
Ti-6Al-4V ELI alloy has higher strength and good processing performance, which are widely used in medical industry and covers a broad range of applications including joint replacement, dental implants, bone plate for fracture fixation and surgical instruments.
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Ti6Al7Nb are broadly used in bio-medical fields. Ti6Al4V alloy currently having most applications is queried because of containing poisonous V element for body cell, so Ti6Al7Nb alloy is best replacement through using nontoxic Nb element instead of V
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JINXING METAL offers a complete line of sputtering targets ranging from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all commercially available systems or to specific dimensions required for your particular applications. A number of metallurgical techniques are employed in PVD material fabrication.
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JINXING METAL.'s unique enhanced design sputtering targets are produced for use in the sputtering of precious metals and magnetic materials, thereby increasing target utilization. Through engineering design, the enhanced profile provides utilization factors far in excess of those conventionally found in planar designed targets.By taking the inverse of the erosion profile, thus increasing the target thickness in this area
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JINXING METAL.'s unique enhanced design sputtering targets are produced for use in the sputtering of precious metals and magnetic materials, thereby increasing target utilization. Through engineering design, the enhanced profile provides utilization factors far in excess of those conventionally found in planar designed targets.By taking the inverse of the erosion profile, thus increasing the target thickness in this area
