High purity 99.999% Tungsten sputtering target　

tungsten sputtering targets of Description

 1. An important way to make thin-film material is sputtering a new way of physical vapor deposition (PVD). The thin-film made by target is characterized by high density and good adhesiveness. As the magnetron sputtering techniques being widely applied, the high pure metal and alloy targets are in great need. Being with high melting point,