High purity W Sputtering Target Tungsten target 99.95%

Specification of W Sputtering Target

JX metal specializes in producing high purity Tungsten Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading,