Zirconium Zr Sputtering Targets Description
Thin film deposition (coating) is the process of forming and depositing a thin film coating on a substrate material that can be used to change or improve certain elements of the properties of the substrate and is an important manufacturing step in the production of many optoelectronic, solid-state and medical devices and products. Zirconium Zr Sputtering Targets is mainly made of high purity zirconium metal after forging,
High Purity Zirconium 702 Crucible Description
Zirconium has a very small neutron absorption cross-section and a relatively high melting point, making it a good material for nuclear power rods. High Purity Zirconium 702 Crucible is usually made through a series of processes such as injection molding, rolling, powder pressing, sintering, cutting and polishing. It has high melting point, strong thermal conductivity, high purity, corrosion resistance, good high temperature stability, and Wear,
High purity Zirconium sputtering target, Zr sputtering targets
Zirconium sputtering target of Product Introduction
Zirconium is a lustrous, greyish-white, soft, ductile and malleable metal that is solid at room temperature, though it is hard and brittle at lesser purities. The melting point of zirconium is 1855 °C (3371 °F), and the boiling point is 4371 °C (7900 °F). Zirconium has an electronegativity of 1.33 on the Pauling scale.
High purity Zirconium sputtering target, Zr sputtering targets
Zirconium Sputtering Target of Product Description
Zirconium is a lustrous, greyish-white, soft, ductile and malleable metal that is solid at room temperature, though it is hard and brittle at lesser purities. The melting point of zirconium is 1855 °C (3371 °F), and the boiling point is 4371 °C (7900 °F). Zirconium has an electronegativity of 1.33 on the Pauling scale.
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High purity Zirconium sputtering target, Zr sputtering targets
We are professional factory to produce all kinds of materials Disc/Planar/Rotary sputtering target. Ti sputtering target, Zr sputtering target, Cr sputtering target, Ni sputtering target, Cu sputtering target, Mo sputtering target, W sputtering target, Nb sputtering target, Ta sputtering target, V sputtering target, Al-Ti sputtering target, Ni-Cr sputtering target, Nb-Zr sputtering target,